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Ion Implantation
In-situ removal of AsH3, PH3, BF3 by-products before or after ion source pump, directly within implanter housing with stand-alone CLEANSORB CS015SA Dry Scrubber.
Ion Implantation
The ion source-, and target chamber exhaust of 5 ion implanters combined into one CLEANSORB BX High-Flow System. Including integrated blower and electrochemical gas sensor.
Typical absorbing lifetime of column: 2 years
Ion Implantation
Features and Benefits
No handling of toxic waste by user
Room temperature conversion of hazardous gases into stable salts
Suitable for operation at negative pressure
Outlet Concentrations below TLV:
AsH3 < 0.05 ppm, PH3 < 0.3 ppm, BF3 < 1 ppm
Passive Operating Principle Eliminates Facilities Consumption (Electricity, Fuel, Water)