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CS CLEAN SYSTEMS joins prestigious F450C consortium for development of next-generation wafer technology

Ismaning, August 2013

As a leading edge solutions provider for the abatement of semiconductor exhaust gases, CS CLEAN SYSTEMS is proud to participate in the Facilities 450 mm Consortium. It will add its expertise in the reduction of installation costs and media consumption, energy-saving, workplace safety and environmental-friendly manufacturing.

Joe Guerin, Head of Sales & Marketing of CS CLEAN SYSTEMS commented: “Wafer production at the 450mm wafer scale will be even less tolerant of tool downtime than at present, and manufacturers will be seeking new ways to reduce installation costs and conserve facility resources. CS CLEAN SYSTEMS’ unique dry bed chemisorption technology offers key advantages in each of these areas. We are grateful for this opportunity to work closely with leading industry partners right from the early stages of this exciting new technology”.

The consortium will use the capabilities established at CNSE for joint development activities and support of a comprehensive industry ecosystem. For more information, visit www.g450c.org

About F450C:

The Facilities 450mm Consortium (F450C) is a first-of-its-kind partnership at SUNY’s College of Nanoscale Science and Engineering (CNSE) that is leading the global effort to design and build next-generation 450mm computer chip fabrication facilities. The collaboration includes 10 of the world’s leading nanoelectronics facility companies, including Air Liquide, CH2M HILL, CS Clean Systems, Ceres Technologies, Edwards, Haws Corporation, Mega Fluid Systems, M+W Group, Ovivo, and Swagelok. Members of F450C are working closely with the Global 450mm Consortium (G450C), as announced by New York Governor Andrew M. Cuomo, to identify viable solutions required for 450mm high-volume facility construction, with initial focus areas to include reducing tool installation cost and duration, and improving facility sustainability.