deutsch    english    español    한국어    中文    русский    日本語
header image
Application List Liquid Precursor Supply Systems

Chemical FormulaChemical NameFilmApplication
Al(CH3)3TMAAl2O3ALD high-k Gate Oxide, Capacitor
Hf[N(CH3)(C2H5)]4TEMAHHfO2
ALD high-k Gate Oxide
Hf[N(CH3)2]4TDMAHHfO2
ALD high-k Gate Oxide
Hf[N(C2H5)2]4TDEAHHfO2
ALD high-k Gate Oxide
Ta(OC2H5)5TAETO, PETTa2O5ALD high-k Capacitor
TiCl4TiCl4TiNALD, CVD Barrier/Liner
Ti[N(CH3)2]4TDMATTiNALD, CVD Barrier/Liner
Ti[N(C2H5)2]4TDEATTiNALD, CVD Barrier/Liner
Si2Cl6, C5H5NHCDS/ PyridineSiNALD, CVD Spacer, Capacitor
SiCl4, C5H5NSiCl4/ PyridineSiNALD, CVD Spacer, Capacitor
C4H8NCH3•AlH3MPA (1-Methylpyrrolidine Alane)AlALD Gate Electrode
Ru(C2H5C5H4)2Ru(Etcp)2RuO2ALD Gate Electrode
Ta[N(C2H5)(CH3)]5PEMATTaNALD Gate Electrode
Ta[N(C2H5)2]3NC(CH3)3Tantalum tris(diethylamino)-t-butylimide, TBTDETTaNALD Gate Electrode
Al(CH3)3 TMAAlGaAs, InAlGaP, AlGaN, InAlAsMOCVD
Ga(CH3)3TMGaGaAs, AlGaAs, InAlGaP, AlGaNMOCVD
AsH2(C4H9)TBA Tertiary ButylarsineDopantMOCVD
PH2(C4H9)TBP Tertiary ButylphosphineDopantMOCVD
(CH3)2N-NH2UDMHGaInAsN, GaAsNMOCVD
Si(OCH2CH3)4TEOSSiO2CVD Dielectric
B(OCH)3TMBDopantCVD Dielectric
PO(OCH3)3TMOPDopantCVD Dielectric
(C4H9NH)2SiH2BTBAS (Bis(tertiary-butylamino) silane)SiNxCVD Barrier
Si(CH3)44MSSiCxOyCVD low-k
[CH3SiOH]4TMCTSSiCxOyCVD low-k
[(CH3)2SiO]4OMCTS, D4SiCxOyCVD low-k
Si(CH3)2(OCH3)2DMDMOS Aurora ISiCxOyCVD low-k
SiH(CH3)3TMS, 3MSSiCxOyCVD low-k
(CH3)2(CH3O)SiO-Si(OCH3)(CH3)2TMDMODSO, Aurora IISiCxOyCVD low-k
(CH3)2(CH3O)SiO-Si(CH3)2OSi(OCH3)(CH3)2HMDMOTSO,1,5-Dimethoxyhexa-methyltrisiloxane Aurora IIISiCxOyCVD low-k
Si3H8Trisilane, Silcor®SiEpitaxy