Latest generation semiconductor materials used for deposition of low-k and high-k dielectrics, barrier layers and metallization generally require UHP precursors in liquid form. Compared with conventional UHP gas supply systems, the challenges involved in delivering liquids accurately and safely to the tool are greatly increased.

The function of the TRICHEM Delivery System is to assure a safe and consistent supply of UHP liquid precursor to a CVD or ALD tool, enabling it to stay up-and-running for prolonged production cycles without interruption.

Depending on the application, the system can be configured for either batch-fill mode for bubbler replenishment or for constant pressure supply for direct liquid injection.